Sputtering Target Manufacturer High Purity 3n5 4n 4n5 Ta Target Tantalum Sputtering Target

• Protection: Resistance to Corrosion, High Melting Point
• Usage: Alloys, Electronics
• Shape: Round
• Concentrate or Not: 99.95%
• Transport Package: Wooden Box
• Specification: customized
• Model NO.: Tantalum Sputtering Target
• Trademark: ZX. TIG
• Origin: Shaanxi, China
• HS Code: 8103909090
• Production Capacity: 60000t/a

Product Description

Product name	Tantalum sheet ,tantalum rod, tantalum wire, tantalum target,tantalum foil ,tantalum crucible/nut/bolt/cap/cup/tip etc.
Material	Pure tantalum and tantalum alloy
Grade	R05200 R05252 R05400
Standard	ASTMB 365 ASTM B708   ASTM B521
Process	Cold rolled, Hot rolled, Extruded
Characteristic	Melting point : 2996ºC / Boiling point : 5423ºC
Density	16.65g/cm3

Why Choose Us?

• 53 years of R&D and production experience 
• Leading non-ferrous metals manufacture in China    
• State-owned company with great credit and strong financial strength
• Cost control-manufacturing and exporting by ourselves
• Competitive price-without middleman
• Strict quality control system
• On time delivery 

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